Atomic Layer Deposition of Boron-Containing Layers Using a Combined Trimethylborate- and Water-Based Plasma

dc.contributor.author	Dhara, Arpan
dc.contributor.author	Werbrouck, Andreas
dc.contributor.author	Li, Jin
dc.contributor.author	Verhelle, Tippi
dc.contributor.author	Minjauw, Matthias M.
dc.contributor.author	Meersschaut, Johan
dc.contributor.author	Henderick, Lowie
dc.contributor.author	Dendooven, Jolien
dc.contributor.author	Detavernier, Christophe
dc.contributor.imecauthor	Meersschaut, Johan
dc.contributor.orcidimec	Meersschaut, Johan::0000-0003-2467-1784
dc.date.accessioned	2025-05-03T05:30:33Z
dc.date.available	2025-05-03T05:30:33Z
dc.date.issued	2025-APR 22
dc.description.wosFundingText	This work was financially supported by the UGENT-GOA-01G02124 project and Fonds Wetenschappelijk Onderzoek - Vlaanderen (FWO) by providing Tippi Verhelle with an SB grant (1SH9024N) and Lowie Henderick with a junior postdoctoral fellowship (1254324N).
dc.identifier.doi	10.1021/acs.chemmater.4c03385
dc.identifier.issn	0897-4756
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/45578
dc.publisher	AMER CHEMICAL SOC
dc.source.journal	CHEMISTRY OF MATERIALS
dc.source.numberofpages	10
dc.subject.keywords	THIN-FILMS
dc.subject.keywords	PHOSPHATE
dc.subject.keywords	EFFICIENT
dc.subject.keywords	ELECTRODE
dc.title	Atomic Layer Deposition of Boron-Containing Layers Using a Combined Trimethylborate- and Water-Based Plasma
dc.type	Journal article
dspace.entity.type	Publication
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