Publication:

Modulating the resistivity of MoS2 through low energy phosphorus plasma implantation

Date

2017
Journal article
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-3114-718X
cris.virtual.orcid0000-0002-7230-7218
cris.virtualsource.department199fad1e-bf47-4b27-a7c2-7763e2b21a59
cris.virtualsource.department42aa2097-8350-4612-bef0-19a47bea6708
cris.virtualsource.orcid199fad1e-bf47-4b27-a7c2-7763e2b21a59
cris.virtualsource.orcid42aa2097-8350-4612-bef0-19a47bea6708
dc.contributor.authorHaynes, K.
dc.contributor.authorMurray, R.
dc.contributor.authorWeinrich, Z.
dc.contributor.authorZhao, X.
dc.contributor.authorChiappe, Daniele
dc.contributor.authorSutar, Surajit
dc.contributor.authorRadu, Iuliana
dc.contributor.authorHatem, C.
dc.contributor.authorPerry, S
dc.contributor.authorJones, K
dc.contributor.imecauthorSutar, Surajit
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.date.accessioned2021-10-24T05:31:52Z
dc.date.available2021-10-24T05:31:52Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28473
dc.identifier.urlhttp://aip.scitation.org/doi/full/10.1063/1.4989829
dc.source.beginpage262102
dc.source.issue26
dc.source.journalApplied Physics Letters
dc.source.volume110
dc.title

Modulating the resistivity of MoS2 through low energy phosphorus plasma implantation

dc.typeJournal article
dspace.entity.typePublication
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