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Determination of interface energy band diagram between (100)Si and mixed Al-Hf oxides using internal electron photoemission

Date

2003
Journal article
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dc.contributor.authorAfanas'ev, V.V.
dc.contributor.authorStesmans, Andre
dc.contributor.authorTsai, Wilman
dc.contributor.imecauthorStesmans, Andre
dc.date.accessioned2021-10-15T03:58:36Z
dc.date.available2021-10-15T03:58:36Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7121
dc.source.beginpage245
dc.source.endpage247
dc.source.issue2
dc.source.journalApplied Physics Letters
dc.source.volume82
dc.title

Determination of interface energy band diagram between (100)Si and mixed Al-Hf oxides using internal electron photoemission

dc.typeJournal article
dspace.entity.typePublication
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