Publication:
UV2Litho: usable vacuum ultra violet lithography
Date
| dc.contributor.author | Goethals, Mieke | |
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.author | Van Roey, F. | |
| dc.contributor.author | Hermans, J. | |
| dc.contributor.author | Eliat, Astrid | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | Wong, P. | |
| dc.contributor.author | Zandbergen, P. | |
| dc.contributor.author | Vasconi, M. | |
| dc.contributor.author | Severgnini, E. | |
| dc.contributor.author | Henke, W. | |
| dc.contributor.author | Hohle, C. | |
| dc.contributor.author | Henry, D. | |
| dc.contributor.author | Thony, P. | |
| dc.contributor.author | Markey, L. | |
| dc.contributor.author | Schiavone, P. | |
| dc.contributor.author | Fuard, D. | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-14T21:43:03Z | |
| dc.date.available | 2021-10-14T21:43:03Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6362 | |
| dc.source.conference | 3th International Symposium on 157nm Lithography | |
| dc.source.conferencedate | 3/09/2002 | |
| dc.source.conferencelocation | Antwerpen Belgium | |
| dc.title | UV2Litho: usable vacuum ultra violet lithography | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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