Publication:

On product overlay characterization after stressed layer etch

Date

2021
Proceedings Paper
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dc.contributor.authorvan Haren, Richard
dc.contributor.authorMouraille, Orion
dc.contributor.authorYildirim, Oktay
dc.contributor.authorVan Dijk, Leon
dc.contributor.authorKumar, Kaushik
dc.contributor.authorFeurprier, Yannick
dc.contributor.authorHermans, Jan
dc.contributor.imecauthorvan Haren, Richard
dc.contributor.imecauthorYildirim, Oktay
dc.contributor.imecauthorKumar, Kaushik
dc.contributor.imecauthorFeurprier, Yannick
dc.contributor.imecauthorHermans, Jan
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.accessioned2021-10-31T12:02:04Z
dc.date.available2021-10-31T12:02:04Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37289
dc.identifier.urlhttps://doi.org/10.1117/12.2584311
dc.source.beginpage116150N
dc.source.conferenceAdvanced Etch Technology and Process Integration for Nanopatterning X
dc.source.conferencedate21/02/2021
dc.source.conferencelocationSan Jose, CA USA
dc.title

On product overlay characterization after stressed layer etch

dc.typeProceedings paper
dspace.entity.typePublication
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