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Overlay metrology for double patterning processes
Publication:
Overlay metrology for double patterning processes
Date
2009
Proceedings Paper
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16954.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Leray, Philippe
;
Cheng, Shaunee
;
Laidler, David
;
Kandel, Daniel
;
Adel, Mike
;
Dinu, Berta
;
Polli, Marco
;
Vasconi, Mauri
;
Salski, Bartlomiej
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1941
since deposited on 2021-10-17
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Acq. date: 2025-10-28
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Metrics
Views
1941
since deposited on 2021-10-17
1
last week
Acq. date: 2025-10-28
Citations