Publication:
A new technique to fabricate Ultra-Shallow-Junctions, combining in-situ vapour HCl etching and in-situ doped epitaxial SiGe re-growth
Date
Loading...
Journal
Abstract
Description
Statistics
Views
2043 since deposited on 2021-10-15
Acq. date: 2026-02-27
Citations
Statistics
Views
2043 since deposited on 2021-10-15
Acq. date: 2026-02-27
Citations