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EOT-scaling by interface layer scavenging and HfO2 $j-value increase in high-k/metal gate CMOS devices: trade-offs and perspectives
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1832 since deposited on 2021-10-22
Acq. date: 2026-01-10
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Views
1832 since deposited on 2021-10-22
Acq. date: 2026-01-10
Citations