Publication:

Microstructure and resistivity characterization of CuAu I superlattice formed in Cu/Au thin films

Date

2004
Journal article
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dc.contributor.authorZhang, Wenqi
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorRichard, Olivier
dc.contributor.authorBrijs, Bert
dc.contributor.authorPalmans, Roger
dc.contributor.authorFroyen, Ludo
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-15T18:14:59Z
dc.date.available2021-10-15T18:14:59Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9976
dc.source.beginpage2715
dc.source.endpage2718
dc.source.issue6
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.volume22
dc.title

Microstructure and resistivity characterization of CuAu I superlattice formed in Cu/Au thin films

dc.typeJournal article
dspace.entity.typePublication
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