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PR and BARC wet strip in BEOL patterning using a UV-enabled aqueous process

Date

2011
Meeting abstract
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dc.contributor.authorKesters, Els
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorLux, Marcel
dc.contributor.authorVereecke, Guy
dc.contributor.authorStruyf, Herbert
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-19T14:47:40Z
dc.date.available2021-10-19T14:47:40Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19168
dc.source.beginpage2057
dc.source.conferenceElectrochemical Society Fall Meeting Symposium E7 - Semiconductor Cleaning Science and Technology 12 - SCST
dc.source.conferencedate9/10/2011
dc.source.conferencelocationBoston, MA USA
dc.title

PR and BARC wet strip in BEOL patterning using a UV-enabled aqueous process

dc.typeMeeting abstract
dspace.entity.typePublication
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