Atomic layer etching of InGaZnO thin films via plasma hydrocarbonation and oxygen radical reaction

dc.contributor.author	Li, Jie
dc.contributor.author	Kundu, Shreya
dc.contributor.author	Souriau, Laurent
dc.contributor.author	Belmonte, Attilio
dc.contributor.author	Devriendt, Katia
dc.contributor.imecauthor	Li, Jie
dc.contributor.imecauthor	Kundu, Shreya
dc.contributor.imecauthor	Souriau, Laurent
dc.contributor.imecauthor	Belmonte, Attilio
dc.contributor.imecauthor	Devriendt, Katia
dc.contributor.orcidimec	Li, Jie::0009-0005-0093-537X
dc.contributor.orcidimec	Kundu, Shreya::0000-0001-8052-7774
dc.contributor.orcidimec	Souriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimec	Belmonte, Attilio::0000-0002-3947-1948
dc.contributor.orcidimec	Devriendt, Katia::0000-0002-0662-7926
dc.date.accessioned	2025-08-18T03:58:57Z
dc.date.available	2025-08-18T03:58:57Z
dc.date.issued	2025-AUG 1
dc.identifier.doi	10.1088/1361-6595/adf667
dc.identifier.issn	0963-0252
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/46089
dc.publisher	IOP Publishing Ltd
dc.source.issue	8
dc.source.journal	PLASMA SOURCES SCIENCE & TECHNOLOGY
dc.source.numberofpages	11
dc.source.volume	34
dc.subject.keywords	RAY PHOTOELECTRON-SPECTROSCOPY
dc.subject.keywords	GALLIUM-ZINC-OXIDE
dc.subject.keywords	INDIUM
dc.title	Atomic layer etching of InGaZnO thin films via plasma hydrocarbonation and oxygen radical reaction
dc.type	Journal article
dspace.entity.type	Publication
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