Publication:

Determination of photoresist degradation products in O3/DI water processing

Date

2001
Proceedings Paper
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cris.virtual.orcid0009-0007-6964-7434
cris.virtual.orcid0000-0003-3775-3578
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtualsource.department3e15c10a-8884-477b-b40c-a6ff454aa560
cris.virtualsource.department1fd77399-4d0a-4004-8a7f-9634c67c90de
cris.virtualsource.department71dc0efb-51fe-4642-a819-927df76262a0
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cris.virtualsource.orcid71dc0efb-51fe-4642-a819-927df76262a0
dc.contributor.authorVankerckhoven, Hans
dc.contributor.authorDe Smedt, Frank
dc.contributor.authorVan Herp, Bart
dc.contributor.authorClaes, Martine
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorVinckier, Chris
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-14T18:05:00Z
dc.date.available2021-10-14T18:05:00Z
dc.date.embargo9999-12-31
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5738
dc.source.beginpage207
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS
dc.source.conferencedate18/09/2000
dc.source.conferencelocationOostende Belgium
dc.source.endpage210
dc.title

Determination of photoresist degradation products in O3/DI water processing

dc.typeProceedings paper
dspace.entity.typePublication
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