Gate MOSCAP Studies on Electroless Deposited Nickel Boron as Word Line Candidate Metal for Future Scaled 3-D NAND Flash

dc.contributor.author	Ramesh, Siva
dc.contributor.author	Rachidi, Sana
dc.contributor.author	Donadio, Gabriele Luca
dc.contributor.author	Van den Bosch, Geert
dc.contributor.author	Rosmeulen, Maarten
dc.contributor.imecauthor	Ramesh, Siva
dc.contributor.imecauthor	Rachidi, Sana
dc.contributor.imecauthor	Donadio, Gabriele Luca
dc.contributor.imecauthor	Van den Bosch, Geert
dc.contributor.imecauthor	Rosmeulen, Maarten
dc.contributor.orcidimec	Ramesh, Siva::0000-0002-8473-7258
dc.contributor.orcidimec	Rachidi, Sana::0000-0001-8581-8597
dc.contributor.orcidimec	Van den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimec	Rosmeulen, Maarten::0000-0002-3663-7439
dc.date.accessioned	2023-07-07T08:24:23Z
dc.date.available	2023-05-04T19:59:26Z
dc.date.available	2023-07-07T08:24:23Z
dc.date.issued	2023
dc.identifier.doi	10.1149/2162-8777/accb66
dc.identifier.issn	2162-8769
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/41565
dc.publisher	ELECTROCHEMICAL SOC INC
dc.source.beginpage	Art. 045003
dc.source.endpage	na
dc.source.issue	4
dc.source.journal	ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
dc.source.numberofpages	7
dc.source.volume	12
dc.subject.keywords	IMPACT
dc.title	Gate MOSCAP Studies on Electroless Deposited Nickel Boron as Word Line Candidate Metal for Future Scaled 3-D NAND Flash
dc.type	Journal article
dspace.entity.type	Publication
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