Publication:

EUVL Gen 2.0: Key requirements for constraining semiconductor cost in advanced technology node manufacturing

Date

2018
Proceedings Paper
Simple item page Full metadata Statistics
 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-0742-9366
cris.virtual.orcid0000-0003-0803-4267
cris.virtual.orcid0000-0003-3825-5554
cris.virtualsource.departmentdd58335d-8a2a-4401-8914-5de314f80d91
cris.virtualsource.department987ea135-86ab-40b5-a86e-f94391ccf5fe
cris.virtualsource.departmentcd229996-283c-420d-b3a4-343d55a60b34
cris.virtualsource.orciddd58335d-8a2a-4401-8914-5de314f80d91
cris.virtualsource.orcid987ea135-86ab-40b5-a86e-f94391ccf5fe
cris.virtualsource.orcidcd229996-283c-420d-b3a4-343d55a60b34
dc.contributor.authorMallik, Arindam
dc.contributor.authorDebacker, Peter
dc.contributor.authorMcIntyre, Greg
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorMallik, Arindam
dc.contributor.imecauthorDebacker, Peter
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecMallik, Arindam::0000-0002-0742-9366
dc.contributor.orcidimecDebacker, Peter::0000-0003-3825-5554
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-25T22:50:25Z
dc.date.available2021-10-25T22:50:25Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31272
dc.identifier.urlhttps://doi.org/10.1117/12.2297447
dc.source.beginpage1058326
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IX
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.title

EUVL Gen 2.0: Key requirements for constraining semiconductor cost in advanced technology node manufacturing

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
36933.pdf
Size:
763.39 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions