Publication:
Different nature of process-induced and stress-induced defects in thin SiO2 layers
Date
| dc.contributor.author | Cellere, G. | |
| dc.contributor.author | Valentini, M.G. | |
| dc.contributor.author | Pantisano, Luigi | |
| dc.contributor.author | Cheung, K.P. | |
| dc.contributor.author | Paccagnella, A. | |
| dc.date.accessioned | 2021-10-15T04:07:23Z | |
| dc.date.available | 2021-10-15T04:07:23Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7299 | |
| dc.source.beginpage | 393 | |
| dc.source.endpage | 395 | |
| dc.source.issue | 6 | |
| dc.source.journal | IEEE Electron Device Letters | |
| dc.source.volume | 24 | |
| dc.title | Different nature of process-induced and stress-induced defects in thin SiO2 layers | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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