Publication:

Attenuated phase shift maks using MoSi as an opaque layer

Date

1995
Proceedings Paper
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-2211-9443
cris.virtualsource.department386aec34-c796-442e-8812-e827cd030994
cris.virtualsource.orcid386aec34-c796-442e-8812-e827cd030994
dc.contributor.authorPopa, Ovidiu
dc.contributor.authorJonckheere, Rik
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-09-29T13:15:46Z
dc.date.available2021-09-29T13:15:46Z
dc.date.embargo9999-12-31
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/825
dc.source.beginpage171
dc.source.conference18th International Semiconductor Conference. CAS'95 Proceedings
dc.source.conferencedate10/10/1995
dc.source.conferencelocationSinaia Romania
dc.source.endpage4
dc.title

Attenuated phase shift maks using MoSi as an opaque layer

dc.typeProceedings paper
dspace.entity.typePublication
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