Publication:

ArF immersion lithography for low k1 lines and contacts

Date

2004-08
Proceedings Paper
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dc.contributor.authorVandenberghe, Geert
dc.contributor.authorHendrickx, Eric
dc.contributor.authorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorWiaux, Vincent
dc.date.accessioned2021-10-15T17:20:32Z
dc.date.available2021-10-15T17:20:32Z
dc.date.issued2004-08
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9811
dc.source.beginpage?
dc.source.conferenceInternational Symposium on Immersion and 157nm Lithography
dc.source.conferencedate2/08/2004
dc.source.conferencelocationVancouver Canada
dc.title

ArF immersion lithography for low k1 lines and contacts

dc.typeProceedings paper
dspace.entity.typePublication
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