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Roughness characterization in the frequency domain and linewidth roughness mitigation with post-lithography processes
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Roughness characterization in the frequency domain and linewidth roughness mitigation with post-lithography processes
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Date
2010
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
;
Gronheid, Roel
;
Foubert, Philippe
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
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Views
1844
since deposited on 2021-10-18
1
last month
1
last week
Acq. date: 2026-07-16
Citations