Publication:

Study of cobalt wet recess for fully self aligned vias in advanced interconnects

Date

2019
Meeting abstract
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dc.contributor.authorAkanishi, Yuya
dc.contributor.authorPacco, Antoine
dc.contributor.authorHolsteyns, Frank
dc.contributor.imecauthorAkanishi, Yuya
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorHolsteyns, Frank
dc.date.accessioned2021-10-27T07:25:23Z
dc.date.available2021-10-27T07:25:23Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32416
dc.source.beginpage4.15
dc.source.conferenceIEEE International Interconnect Technology Conference (IITC 2019) and Materials for Advanced Metallization Conference (MAM 2019)
dc.source.conferencedate3/06/2019
dc.source.conferencelocationBrussels Begium
dc.title

Study of cobalt wet recess for fully self aligned vias in advanced interconnects

dc.typeMeeting abstract
dspace.entity.typePublication
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