Publication:

Ultra-thin oxide growth on silicon using ozonated solutions

Date

1998
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorDe Smedt, Frank
dc.contributor.authorVinckier, Chris
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorMeuris, Marc
dc.contributor.authorGilis, G.
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-09-30T11:43:45Z
dc.date.available2021-09-30T11:43:45Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2504
dc.source.conference4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
dc.title

Ultra-thin oxide growth on silicon using ozonated solutions

dc.typeOral presentation
dspace.entity.typePublication
Files
Publication available in collections:
Presentations