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Fabrication of ultra-compact photonic structures in Silicon-on-Insulator (SOI) using 248nm deep lithography

Date

2002
Proceedings Paper
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dc.contributor.authorBogaerts, Wim
dc.contributor.authorWiaux, Vincent
dc.contributor.authorTaillaert, Dirk
dc.contributor.authorBeckx, Stephan
dc.contributor.authorBaets, Roel
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.accessioned2021-10-14T21:10:23Z
dc.date.available2021-10-14T21:10:23Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6043
dc.source.beginpage30
dc.source.conference4th International Conference on Transparent Optical Networks - ICTON
dc.source.conferencedate21/04/2002
dc.source.conferencelocationWarsaw Poland
dc.source.endpage33
dc.title

Fabrication of ultra-compact photonic structures in Silicon-on-Insulator (SOI) using 248nm deep lithography

dc.typeProceedings paper
dspace.entity.typePublication
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