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Unraveling the EUV photoresist reactions : which, how much, and how do they relate to printing performance

Date

2019
Proceedings Paper
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dc.contributor.authorPollentier, Ivan
dc.contributor.authorPetersen, John
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorPetersen, John
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2021-10-27T16:15:08Z
dc.date.available2021-10-27T16:15:08Z
dc.date.embargo9999-12-31
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33815
dc.identifier.urlhttps://doi.org/10.1117/12.2515456
dc.source.beginpage109570I
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography X
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose, CA USA
dc.title

Unraveling the EUV photoresist reactions : which, how much, and how do they relate to printing performance

dc.typeProceedings paper
dspace.entity.typePublication
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