Publication:
Unraveling the EUV photoresist reactions : which, how much, and how do they relate to printing performance
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-4815-3770 | |
| cris.virtual.orcid | 0009-0001-2424-1322 | |
| cris.virtual.orcid | 0000-0002-8297-5076 | |
| cris.virtual.orcid | 0000-0003-3927-5207 | |
| cris.virtual.orcid | 0000-0002-4266-6500 | |
| cris.virtualsource.department | 0cad242e-b04f-43bb-be0d-cfcf7a41da8f | |
| cris.virtualsource.department | b4f8c238-ae6a-4a36-b09f-6a93bec3afa5 | |
| cris.virtualsource.department | bf23291b-8cd7-495b-b210-564de11c9d4f | |
| cris.virtualsource.department | ffad9b55-9af5-4edb-8c86-134820dc8dd9 | |
| cris.virtualsource.department | 82fbecb6-a915-4354-8ca7-fdcb5a3d9f37 | |
| cris.virtualsource.orcid | 0cad242e-b04f-43bb-be0d-cfcf7a41da8f | |
| cris.virtualsource.orcid | b4f8c238-ae6a-4a36-b09f-6a93bec3afa5 | |
| cris.virtualsource.orcid | bf23291b-8cd7-495b-b210-564de11c9d4f | |
| cris.virtualsource.orcid | ffad9b55-9af5-4edb-8c86-134820dc8dd9 | |
| cris.virtualsource.orcid | 82fbecb6-a915-4354-8ca7-fdcb5a3d9f37 | |
| dc.contributor.author | Pollentier, Ivan | |
| dc.contributor.author | Petersen, John | |
| dc.contributor.author | De Bisschop, Peter | |
| dc.contributor.author | De Simone, Danilo | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.imecauthor | Pollentier, Ivan | |
| dc.contributor.imecauthor | Petersen, John | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.contributor.imecauthor | De Simone, Danilo | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
| dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
| dc.date.accessioned | 2021-10-27T16:15:08Z | |
| dc.date.available | 2021-10-27T16:15:08Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2019 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33815 | |
| dc.identifier.url | https://doi.org/10.1117/12.2515456 | |
| dc.source.beginpage | 109570I | |
| dc.source.conference | Extreme Ultraviolet (EUV) Lithography X | |
| dc.source.conferencedate | 24/02/2019 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | Unraveling the EUV photoresist reactions : which, how much, and how do they relate to printing performance | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |