Publication:

Ultra-thin gate oxide yield and reliability

Date

1994
Proceedings Paper
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dc.contributor.authorDepas, Michel
dc.contributor.authorVermeire, Bert
dc.contributor.authorMertens, Paul
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-09-29T12:40:51Z
dc.date.available2021-09-29T12:40:51Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/131
dc.source.beginpage23
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate09/06/1994
dc.source.conferencelocationHawaii USA
dc.source.endpage24
dc.title

Ultra-thin gate oxide yield and reliability

dc.typeProceedings paper
dspace.entity.typePublication
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