Publication:
Self-aligned block and fully self-aligned via for iN5 metal 2 self-aligned quadruple patterning
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0001-7961-9727 | |
| cris.virtual.orcid | 0000-0002-6314-2685 | |
| cris.virtual.orcid | 0000-0002-6833-220X | |
| cris.virtualsource.department | d70ee97b-1cd7-4648-9ef2-ac106b21dfb5 | |
| cris.virtualsource.department | 1fc7b9f7-9367-45d8-be12-90bcb20ebcbd | |
| cris.virtualsource.department | 0ec81bcc-d43f-4489-99f0-e6cd9aa2c9a4 | |
| cris.virtualsource.orcid | d70ee97b-1cd7-4648-9ef2-ac106b21dfb5 | |
| cris.virtualsource.orcid | 1fc7b9f7-9367-45d8-be12-90bcb20ebcbd | |
| cris.virtualsource.orcid | 0ec81bcc-d43f-4489-99f0-e6cd9aa2c9a4 | |
| dc.contributor.author | Vincent, Benjamin | |
| dc.contributor.author | Franke, Joern-Holger | |
| dc.contributor.author | Juncker, Aurelie | |
| dc.contributor.author | Lazzarino, Frederic | |
| dc.contributor.author | Murdoch, Gayle | |
| dc.contributor.author | Halder, Sandip | |
| dc.contributor.author | Ervin, Joseph | |
| dc.contributor.imecauthor | Vincent, Benjamin | |
| dc.contributor.imecauthor | Franke, Joern-Holger | |
| dc.contributor.imecauthor | Lazzarino, Frederic | |
| dc.contributor.imecauthor | Murdoch, Gayle | |
| dc.contributor.imecauthor | Halder, Sandip | |
| dc.contributor.orcidimec | Franke, Joern-Holger::0000-0002-3571-1633 | |
| dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
| dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
| dc.date.accessioned | 2021-10-26T08:45:44Z | |
| dc.date.available | 2021-10-26T08:45:44Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2018 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/32213 | |
| dc.identifier.url | https://doi.org/10.1117/12.2298761 | |
| dc.source.beginpage | 105830W | |
| dc.source.conference | Extreme Ultraviolet (EUV) Lithography IX | |
| dc.source.conferencedate | 25/02/2018 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | Self-aligned block and fully self-aligned via for iN5 metal 2 self-aligned quadruple patterning | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |