Publication:
The unavoidable renaissance of electron metrology in the age of High NA EUV
Date
| dc.contributor.author | Lorusso, Gian | |
| dc.contributor.imecauthor | Lorusso, Gian | |
| dc.date.accessioned | 2021-10-31T09:35:59Z | |
| dc.date.available | 2021-10-31T09:35:59Z | |
| dc.date.issued | 2021 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/36923 | |
| dc.identifier.url | https://doi.org/10.1117/12.2583828 | |
| dc.source.beginpage | 1161127 | |
| dc.source.conference | Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV | |
| dc.source.conferencedate | 21/02/2021 | |
| dc.source.conferencelocation | San Jose California | |
| dc.title | The unavoidable renaissance of electron metrology in the age of High NA EUV | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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