Publication:
Reduction of NiGe/n- and p-Ge specific contact resistivity by enhanced dopant segregation in the presence of carbon during nickel germanidation
Date
cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
cris.virtual.orcid | 0000-0002-5218-4046 | |
cris.virtualsource.department | 715a9ada-0798-46d2-a8ca-4775db9a8e46 | |
cris.virtualsource.orcid | 715a9ada-0798-46d2-a8ca-4775db9a8e46 | |
dc.contributor.author | Duan, N. | |
dc.contributor.author | Luo, J. | |
dc.contributor.author | Wang, G. | |
dc.contributor.author | Liu, J. | |
dc.contributor.author | Simoen, Eddy | |
dc.contributor.author | Mao, S. | |
dc.contributor.author | Radamson, H. | |
dc.contributor.author | Wang, X. | |
dc.contributor.author | Li, J. | |
dc.contributor.author | Wang, W. | |
dc.contributor.author | Zhao, C. | |
dc.contributor.author | Ye, T. | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.date.accessioned | 2021-10-23T10:41:42Z | |
dc.date.available | 2021-10-23T10:41:42Z | |
dc.date.embargo | 9999-12-31 | |
dc.date.issued | 2016 | |
dc.identifier.issn | 0018-9383 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/26583 | |
dc.identifier.url | http://ieeexplore.ieee.org/document/7579625/ | |
dc.source.beginpage | 4546 | |
dc.source.endpage | 4549 | |
dc.source.issue | 11 | |
dc.source.journal | IEEE Transactions on Electron Devices | |
dc.source.volume | 63 | |
dc.title | Reduction of NiGe/n- and p-Ge specific contact resistivity by enhanced dopant segregation in the presence of carbon during nickel germanidation | |
dc.type | Journal article | |
dspace.entity.type | Publication | |
Files | Original bundle
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