Publication:

Quantifying LER and its impact on BEOL TDDB reliability at 20nm ½ pitch

Date

2010
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorDemuynck, Steven
dc.contributor.authorRoussel, Philippe
dc.contributor.authorStucchi, Michele
dc.contributor.authorVersluijs, Janko
dc.contributor.authorGishia, Gianni
dc.contributor.authorTokei, Zsolt
dc.contributor.authorDe Roest, David
dc.contributor.authorBeyer, Gerald
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.date.accessioned2021-10-18T16:00:19Z
dc.date.available2021-10-18T16:00:19Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17010
dc.source.conferenceIEEE International Interconnect Technology Conference - IITC
dc.source.conferencedate7/06/2010
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Quantifying LER and its impact on BEOL TDDB reliability at 20nm ½ pitch

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions