Publication:

Treatments for reliability improvement in thick oxides diffusion and gate replacement (D&GR) I/O transistors

Date

2017
Journal article
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dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorCho, Moon Ju
dc.contributor.authorSchram, Tom
dc.contributor.authorSpessot, Alessio
dc.contributor.authorSimoen, Eddy
dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorDentoni Litta, Eugenio
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorThean, Aaron
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorSpessot, Alessio
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorDentoni Litta, Eugenio
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-24T12:12:49Z
dc.date.available2021-10-24T12:12:49Z
dc.date.issued2017
dc.identifier.issn1757-2754
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29302
dc.identifier.urlhttp://www.inderscienceonline.com/doi/abs/10.1504/IJMATEI.2017.085810
dc.source.beginpage53
dc.source.endpage70
dc.source.issue1
dc.source.journalInternational Journal of Materials Engineering Innovation
dc.source.volume8
dc.title

Treatments for reliability improvement in thick oxides diffusion and gate replacement (D&GR) I/O transistors

dc.typeJournal article
dspace.entity.typePublication
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