Publication:

The IMEC-Clean: A clean for advanced CMOS manufacturing

Date

2000
Presentation
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dc.contributor.authorMeuris, Marc
dc.contributor.authorArnauts, Sophia
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorKenis, Karine
dc.contributor.authorLux, Marcel
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorMertens, Paul
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorVos, Rita
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorHeyns, Marc
dc.contributor.authorWolke, K.
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-14T13:23:01Z
dc.date.available2021-10-14T13:23:01Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4583
dc.source.conference7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; 19-21 June 2000; Newark, NJ, USA.
dc.source.conferencelocation
dc.title

The IMEC-Clean: A clean for advanced CMOS manufacturing

dc.typeOral presentation
dspace.entity.typePublication
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