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Simultaneous optimization of the material properties, uniformity and deposition rate of polycrystalline CVD And PECVD silicon-germanium layers for MEMS applications
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1909 since deposited on 2021-10-17
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Acq. date: 2026-08-11
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1909 since deposited on 2021-10-17
1last month
1last week
Acq. date: 2026-08-11
Citations