Publication:

Three-Dimensional-Topological-Insulator Tunnel Diodes

 
dc.contributor.authorFluckey, Stephen P.
dc.contributor.authorTiwari, Sabyasachi
dc.contributor.authorHinkle, Christopher L.
dc.contributor.authorVandenberghe, William G.
dc.contributor.imecauthorTiwari, Sabyasachi
dc.contributor.orcidimecTiwari, Sabyasachi::0000-0002-2216-3893
dc.date.accessioned2023-02-22T10:37:00Z
dc.date.available2023-01-22T03:19:53Z
dc.date.available2023-02-22T10:37:00Z
dc.date.issued2022
dc.description.wosFundingTextThis material is based upon work supported by the National Science Foundation under Grant No. 1802166. This work was supported in part by the Semiconductor Research Corporation (SRC) by the NEWLIMITS Center, and by the National Institute of Standards and Technology (NIST) through Award No. 70NANB17H041.
dc.identifier.doi10.1103/PhysRevApplied.18.064037
dc.identifier.issn2331-7019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41016
dc.publisherAMER PHYSICAL SOC
dc.source.beginpage064037
dc.source.endpagena
dc.source.issue6
dc.source.journalPHYSICAL REVIEW APPLIED
dc.source.numberofpages9
dc.source.volume18
dc.subject.keywordsNEGATIVE DIFFERENTIAL RESISTANCE
dc.title

Three-Dimensional-Topological-Insulator Tunnel Diodes

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections: