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Conference contributions
Channel engineering towards a full low temperature process solution for the 45 nm technology node
Publication:
Channel engineering towards a full low temperature process solution for the 45 nm technology node
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Date
2004
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Severi, Simone
;
Henson, Kirklen
;
Lindsay, Richard
;
Pawlak, Bartek
;
De Meyer, Kristin
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Acq. date: 2026-01-25
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Statistics
Views
1884
since deposited on 2021-10-15
2
last month
Acq. date: 2026-01-25
Citations