Publication:

Optical proximity stability control of ArF immersion clusters

Date

2011
Proceedings Paper
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cris.virtual.orcid0000-0002-5195-9241
cris.virtual.orcid0000-0003-3075-3479
cris.virtual.orcid0009-0000-6198-024X
cris.virtualsource.departmentba46bc85-4f40-4d45-9ae9-787baa5405b9
cris.virtualsource.department8f5fd27d-55ef-418c-94c3-d9a8ce4a3e5c
cris.virtualsource.department2b7ce489-34c7-4552-a48c-03fda193e231
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dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorD'have, Koen
dc.contributor.authorLaenens, Bart
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorCheng, Shaunee
dc.contributor.authorSchreel, Koen
dc.contributor.authorGemmink, Jan-Willem
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorD'have, Koen
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.date.accessioned2021-10-19T20:26:41Z
dc.date.available2021-10-19T20:26:41Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19985
dc.source.beginpage79731I
dc.source.conferenceOptical Microlithography XXIV
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
dc.title

Optical proximity stability control of ArF immersion clusters

dc.typeProceedings paper
dspace.entity.typePublication
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