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Printability study for phase-shift masks at 193nm lithography
Publication:
Printability study for phase-shift masks at 193nm lithography
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Date
2003-01
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Philipsen, Vicky
;
Jonckheere, Rik
Journal
Abstract
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Acq. date: 2026-01-06
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Metrics
Views
1820
since deposited on 2021-10-15
3
last month
2
last week
Acq. date: 2026-01-06
Citations