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Printability study for phase-shift masks at 193nm lithography
Publication:
Printability study for phase-shift masks at 193nm lithography
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Date
2003-01
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Philipsen, Vicky
;
Jonckheere, Rik
Journal
Abstract
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Metrics
Views
1818
since deposited on 2021-10-15
4
last month
1
last week
Acq. date: 2025-12-15
Citations