Publication:

Full field EUV lithography turning into reality at IMEC

Date

2007
Proceedings Paper
Simple item page Full metadata Statistics
 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-3498-5082
cris.virtual.orcid0000-0003-2211-9443
cris.virtual.orcid0000-0003-1249-8902
cris.virtual.orcid0000-0003-0803-4267
cris.virtualsource.department0cddeaa4-4a9c-44ee-a5d6-ba4f3945e8a7
cris.virtualsource.department386aec34-c796-442e-8812-e827cd030994
cris.virtualsource.department1bb8b4e6-2ffe-43d0-8928-327961840fc6
cris.virtualsource.department987ea135-86ab-40b5-a86e-f94391ccf5fe
cris.virtualsource.orcid0cddeaa4-4a9c-44ee-a5d6-ba4f3945e8a7
cris.virtualsource.orcid386aec34-c796-442e-8812-e827cd030994
cris.virtualsource.orcid1bb8b4e6-2ffe-43d0-8928-327961840fc6
cris.virtualsource.orcid987ea135-86ab-40b5-a86e-f94391ccf5fe
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLorusso, Gian
dc.contributor.authorGoethals, Mieke
dc.contributor.authorHermans, Jan
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorMyers, Alan
dc.contributor.authorKim, In Sung
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorStepanenko, Nickolay
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-16T16:58:35Z
dc.date.available2021-10-16T16:58:35Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12368
dc.source.beginpage66070H
dc.source.conferencePhotomask Japan (PMJ) - Photomask and Next-Generation Lithography Mask Technology XIV
dc.source.conferencedate17/04/2007
dc.source.conferencelocationYokohama Japan
dc.title

Full field EUV lithography turning into reality at IMEC

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
15246.pdf
Size:
943.98 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions