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Conference contributions
32nm node technology development using interference immersion lithography
Publication:
32nm node technology development using interference immersion lithography
Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Sewell, H.
;
McCafferty, D.
;
Markoya, L.
;
Hendrickx, Eric
;
Hermans, Jan
;
Ronse, Kurt
Journal
Abstract
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1966
since deposited on 2021-10-16
415
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Views
1966
since deposited on 2021-10-16
415
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations