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Selective area growth of InP in shallow trench isolation (STI) on large scale Si(001) wafer using defect confinement technique
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Selective area growth of InP in shallow trench isolation (STI) on large scale Si(001) wafer using defect confinement technique
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Date
2013
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Merckling, Clement
;
Waldron, Niamh
;
Jiang, Sijia
;
Guo, Weiming
;
Richard, Olivier
;
Douhard, Bastien
;
Moussa, Alain
;
Vanhaeren, Danielle
;
Bender, Hugo
;
Collaert, Nadine
;
Heyns, Marc
;
Thean, Aaron
;
Caymax, Matty
;
Vandervorst, Wilfried
Journal
Journal of Applied Physics
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1878
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Acq. date: 2025-12-11
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Metrics
Views
1878
since deposited on 2021-10-21
1
last month
Acq. date: 2025-12-11
Citations