Publication:

EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy

Date

2011
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dc.contributor.authorBret, Tristan
dc.contributor.authorBaralia, Gabriel
dc.contributor.authorBaur, Christof
dc.contributor.authorBudach, Michael
dc.contributor.authorHofmann, Thorsten
dc.contributor.authorEdinger, Klaus
dc.contributor.authorMagana, John
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-10-19T12:40:08Z
dc.date.available2021-10-19T12:40:08Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18623
dc.source.conference55th International conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBN
dc.source.conferencedate31/05/2011
dc.source.conferencelocationLas Vegas, NV USA
dc.title

EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy

dc.typeOral presentation
dspace.entity.typePublication
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