Publication:

Verification and extension of the MBL technique for photoresist pattern shape measurement

Date

2011
Proceedings Paper
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dc.contributor.authorIsawa, Miki
dc.contributor.authorTanaka, Maki
dc.contributor.authorKazumi, Hideyuki
dc.contributor.authorShishido, Chie
dc.contributor.authorHamamatsu, Akira
dc.contributor.authorHasegawa, Norio
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorLaidler, David
dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.accessioned2021-10-19T14:28:38Z
dc.date.available2021-10-19T14:28:38Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19108
dc.source.beginpage79710Z
dc.source.conferenceMetrology, Inspection, and Process Control XXV
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
dc.title

Verification and extension of the MBL technique for photoresist pattern shape measurement

dc.typeProceedings paper
dspace.entity.typePublication
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