Publication:

Evaluation of post ion-implantation resist strip with the background signal of a light scattering tool

Date

2010
Journal article
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dc.contributor.authorHalder, Sandip
dc.contributor.authorVos, Rita
dc.contributor.authorWada, Masayuki
dc.contributor.authorTsvetanova, Diana
dc.contributor.authorClaes, Martine
dc.contributor.authorMertens, Paul
dc.contributor.authorRadovanovic, Sanda
dc.contributor.authorDighe, Prasanna
dc.contributor.authorAmann, Christophe
dc.contributor.authorSimpson, Gavin
dc.contributor.authorPolli, Marco
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorSimpson, Gavin
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.accessioned2021-10-18T16:49:15Z
dc.date.available2021-10-18T16:49:15Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17208
dc.source.beginpage56504
dc.source.issue5
dc.source.journalJapanese Journal of Applied Physics
dc.source.volume49
dc.title

Evaluation of post ion-implantation resist strip with the background signal of a light scattering tool

dc.typeJournal article
dspace.entity.typePublication
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