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Engineering of Hf1-xAlxOy amorphous dielectrics for high-performance RRAM applications

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dc.contributor.authorFantini, Andrea
dc.contributor.authorGoux, Ludovic
dc.contributor.authorClima, Sergiu
dc.contributor.authorDegraeve, Robin
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorPolimeni, Giuseppe
dc.contributor.authorChen, Yangyin
dc.contributor.authorKomura, Masanori
dc.contributor.authorBelmonte, Attilio
dc.contributor.authorWouters, Dirk
dc.contributor.authorJurczak, Gosia
dc.contributor.imecauthorFantini, Andrea
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorChen, Yangyin
dc.contributor.imecauthorBelmonte, Attilio
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.date.accessioned2021-10-22T01:26:02Z
dc.date.available2021-10-22T01:26:02Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23806
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6849354
dc.source.beginpage1
dc.source.conferenceIEEE 6th International Memory Workshop - IMW
dc.source.conferencedate18/05/2014
dc.source.conferencelocationTaipei Taiwan
dc.source.endpage4
dc.title

Engineering of Hf1-xAlxOy amorphous dielectrics for high-performance RRAM applications

dc.typeProceedings paper
dspace.entity.typePublication
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