Publication:
Plasma nitrided silicon rich oxide as an extension to ultra-thin nitrided oxide gate dielectrics
Date
| dc.contributor.author | Cubaynes, Florence | |
| dc.contributor.author | Venezia, V. | |
| dc.contributor.author | Everaert, Jean-Luc | |
| dc.contributor.author | Shi, Xiaoping | |
| dc.contributor.author | Rothschild, Aude | |
| dc.contributor.author | Schaekers, Marc | |
| dc.contributor.imecauthor | Everaert, Jean-Luc | |
| dc.contributor.imecauthor | Schaekers, Marc | |
| dc.contributor.orcidimec | Schaekers, Marc::0000-0002-1496-7816 | |
| dc.date.accessioned | 2021-10-15T12:59:01Z | |
| dc.date.available | 2021-10-15T12:59:01Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8740 | |
| dc.source.conference | 13th Workshop on Dielectrics in Microelectronics - WODIM | |
| dc.source.conferencedate | 28/06/2004 | |
| dc.source.conferencelocation | Cork Ireland | |
| dc.title | Plasma nitrided silicon rich oxide as an extension to ultra-thin nitrided oxide gate dielectrics | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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