Plasma nitrided silicon rich oxide as an extension to ultra-thin nitrided oxide gate dielectrics

dc.contributor.author	Cubaynes, Florence
dc.contributor.author	Venezia, V.
dc.contributor.author	Everaert, Jean-Luc
dc.contributor.author	Shi, Xiaoping
dc.contributor.author	Rothschild, Aude
dc.contributor.author	Schaekers, Marc
dc.contributor.imecauthor	Everaert, Jean-Luc
dc.contributor.imecauthor	Schaekers, Marc
dc.contributor.orcidimec	Schaekers, Marc::0000-0002-1496-7816
dc.date.accessioned	2021-10-15T12:59:01Z
dc.date.available	2021-10-15T12:59:01Z
dc.date.issued	2004
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/8740
dc.source.conference	13th Workshop on Dielectrics in Microelectronics - WODIM
dc.source.conferencedate	28/06/2004
dc.source.conferencelocation	Cork Ireland
dc.title	Plasma nitrided silicon rich oxide as an extension to ultra-thin nitrided oxide gate dielectrics
dc.type	Proceedings paper
dspace.entity.type	Publication
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