Publication:
W vs. Co-Al as gate fill-metal for aggressively scaled replacement high-k/metal gate devices for (Sub-)22nm technology nodes
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2030 since deposited on 2021-10-20
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Acq. date: 2026-03-17
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2030 since deposited on 2021-10-20
1last month
1last week
Acq. date: 2026-03-17
Citations