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Conference contributions
Effect of radical scavenger and UV irradiation on removal of photoresist and BARC using water/ozone in Cu/low-k interconnect
Publication:
Effect of radical scavenger and UV irradiation on removal of photoresist and BARC using water/ozone in Cu/low-k interconnect
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Date
2009
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18996.pdf
196.23 KB
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Le, Quoc Toan
;
Lux, Marcel
;
Kesters, Els
;
Vereecke, Guy
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Abstract
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1832
since deposited on 2021-10-17
Acq. date: 2025-12-15
Citations
Metrics
Views
1832
since deposited on 2021-10-17
Acq. date: 2025-12-15
Citations