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The optimization of the cleaning process to remove residual bonds of SiC and Si-F after fluorocarbon plasma etch on the silicon surface
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1902 since deposited on 2021-10-06
3last month
Acq. date: 2026-05-19
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Statistics
Views
1902 since deposited on 2021-10-06
3last month
Acq. date: 2026-05-19
Citations