Publication:

Alignment-tolerant taper design for transfer printed III-V-on-si devices

Date

2019
Proceedings Paper
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dc.contributor.authorHaq, Bahawal
dc.contributor.authorRoelkens, Gunther
dc.contributor.imecauthorHaq, Bahawal
dc.contributor.imecauthorRoelkens, Gunther
dc.contributor.orcidimecRoelkens, Gunther::0000-0002-4667-5092
dc.date.accessioned2021-10-27T10:03:44Z
dc.date.available2021-10-27T10:03:44Z
dc.date.embargo9999-12-31
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33097
dc.source.beginpageT.Po2.1
dc.source.conference21st European Conference on Integratred Optics (ECIO 2019)
dc.source.conferencedate24/04/2019
dc.source.conferencelocationGent Belgium
dc.title

Alignment-tolerant taper design for transfer printed III-V-on-si devices

dc.typeProceedings paper
dspace.entity.typePublication
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