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On-line spectral analysis of line edge roughness: algorithms qualification and transfer to etch

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dc.contributor.authorLeunissen, Peter
dc.contributor.authorLorusso, Gian
dc.contributor.authorDiBiase, Tony
dc.contributor.authorYang, H.
dc.contributor.authorAzordegan, A.
dc.contributor.imecauthorLorusso, Gian
dc.date.accessioned2021-10-16T02:52:56Z
dc.date.available2021-10-16T02:52:56Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10772
dc.source.beginpage96
dc.source.endpage101
dc.source.journalSemiconductor FabTech
dc.source.volume25
dc.title

On-line spectral analysis of line edge roughness: algorithms qualification and transfer to etch

dc.typeJournal article
dspace.entity.typePublication
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