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Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water

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dc.contributor.authorPuurunen, Riikka
dc.date.accessioned2021-10-16T04:18:52Z
dc.date.available2021-10-16T04:18:52Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11065
dc.source.beginpage6
dc.source.endpage10
dc.source.issue1_4
dc.source.journalApplied Surface Science
dc.source.volume245
dc.title

Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water

dc.typeJournal article
dspace.entity.typePublication
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