Publication:

Dummy oxide removal in high-K last process integration how to avoid silicon corrosion issue

Date

2013
Proceedings Paper
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dc.contributor.authorSebaai, Farid
dc.contributor.authorVeloso, Anabela
dc.contributor.authorTakahashi,
dc.contributor.authorPacco, Antoine
dc.contributor.authorClaes, Martine
dc.contributor.authorSchaekers, Marc
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorMertens, Paul
dc.contributor.authorStruyf, Herbert
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-21T11:54:54Z
dc.date.available2021-10-21T11:54:54Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23064
dc.source.beginpage13
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XI - UCPSS
dc.source.conferencedate17/09/2013
dc.source.conferencelocationGent Belgium
dc.source.endpage16
dc.title

Dummy oxide removal in high-K last process integration how to avoid silicon corrosion issue

dc.typeProceedings paper
dspace.entity.typePublication
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