Publication:

A study on programmed defect propagation from design to mask to wafer using SEM metrology

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3035709
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dc.contributor.authorBaskaran, Balakumar
dc.contributor.authorSaib, Mohamed
dc.contributor.authorReddy, Bojja Aditya
dc.contributor.authorBeggiato, Matteo
dc.contributor.authorGupta, Mihir
dc.contributor.authorBeral, Christophe
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLorusso, Gian
dc.contributor.authorBekaert, Joost
dc.contributor.authorLeray, Philippe
dc.contributor.imecauthorBaskaran, Balakumar
dc.contributor.imecauthorSaib, Mohamed
dc.contributor.imecauthorReddy, Bojja Aditya
dc.contributor.imecauthorBeggiato, Matteo
dc.contributor.imecauthorGupta, Mihir
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecBaskaran, Balakumar::0000-0002-5651-7768
dc.contributor.orcidimecSaib, Mohamed::0000-0002-5153-5553
dc.contributor.orcidimecReddy, Bojja Aditya::0000-0002-3103-9106
dc.contributor.orcidimecBeggiato, Matteo::0000-0003-0873-9021
dc.contributor.orcidimecGupta, Mihir::0000-0003-0286-7997
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecLorusso, Gian::0000-0003-3498-5082
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.date.accessioned2025-08-29T03:57:11Z
dc.date.available2025-08-29T03:57:11Z
dc.date.issued2024
dc.identifier.doi10.1117/12.3035709
dc.identifier.eisbn978-1-5106-8158-3
dc.identifier.isbn978-1-5106-8157-6
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/46127
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage132160Z
dc.source.conference2024 Conference on Photomask Technology
dc.source.conferencedate2024-09-29
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.numberofpages9
dc.title

A study on programmed defect propagation from design to mask to wafer using SEM metrology

dc.typeProceedings paper
dspace.entity.typePublication
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